2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth

Product Details
Customization: Available
Type: Stainless Steel Heating Equipment
Structure: Vertical Type
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Registered Capital
2000000 RMB
Plant Area
101~500 square meters
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
  • 2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
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Basic Info.

Model NO.
HIQ-22TVF
Max Temperature
2200
Working Temperature
1900
Heating Element
Graphite
Chamber Size
Dia160*160
Voltage
380~440V
Working Power
80kw
Heating Rate
<=15c/Min
Insulation Chamber
Graphite/Tungsten
Thermocouple
W-Re Armoured Thermocouple
Temperature Accuracy
+/-1c
Temperature Uniformity
+/-5c
Max Vacuum
6.67 X 10-3 PA
Pressure Rising Rate
<0.67PA/H
Cooling
Water Cooling
Transport Package
Wooden Box
Specification
Dia160*160
Trademark
HIQ
Origin
China
HS Code
85141090
Production Capacity
46 Sets Per Month

Product Description

2000 degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for crystal growth
 
Introduction of 2000 degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for crystal growth

This equipment is used to experimental vacuum sintering of alloy products and MIM/PM stainless steel products. It is operated in the condition of vacuum or protective atmosphere. Pre-sintering and sintering processes can be achieved in the same furnace simultaneously.

2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth

 
Features of 2000 degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for crystal growth
 

1) Small deformation for workpiece

2) Bright surface color without oxidation

3) high vacuum degree up to 7x10-3Pa or even higher

4) Less heat inertia

5) Easy operating

6) Quick cooling



2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth


Parameters of 2000 degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for crystal growth
Model  
Coverage Area
 
Batch
 
Limit Space
pressure rising rate maximum temperature Air pressure
(mm) (kg) (pa) (pa/h) (°C) (bar)
HIQ-40 Dia160*160 200 4×10-1  or   4×10-3 0.65 2200 6/10
HIQ-60 Dia200*200 300 4×10-1 or    4×10-3 0.65 2200 6/10
HIQ-80 Dia220*220 500 4×10-1  or   4×10-3 0.65 2200 6/10
HIQ-150 Dia300*300 800 4×10-1  or   4×10-3 0.65 2200 6/10
HIQ-200 Dia400*400 1200 4×10-1  or   4×10-3 0.65 2200 6/10
HIQ-300 Dia500*500 1500 4×10-1  or   4×10-3 0.65 2200 6/10

2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth
Company information

We are real and professional OEM of industry furnace over 10 years who has 10 staff of designer and technican experienced for years, 

Main products:

Lab muffle furnace,tube furnace,atmosphere furnace;

Dental zirconia sintering furnace;

Ceramic kiln;

Industrial vacuum furnace,vacuum heat treatment furnace;

Vacuum hot press furnace;

Vacuum oil quenching furnace;

Vacuum gas quenching furnace;

2000 Degree Ultra High Temperature Graphite/Tungsten Heating Vacuum Furnace for Crystal Growth


Looking forward to our good cooperation!

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